Diffusion Profile of Some Metal Ions in Chalcogenide Amorphous Semiconductors-Reference-Cited by-同舟云学术

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Diffusion Profile of Some Metal Ions in Chalcogenide Amorphous Semiconductors

Published:1984-08-20 Issue:Part 2, No. 8 Volume:23 Page:L651-L653
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Okano Shuichi,Suzuki Masakuni,Fukada Noboru,Imura Takeshi,Hiraki Akio

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Silver photodissolution in amorphous chalcogenide thin films;Thin Solid Films;1992-10

2. Study of isotopic silver dissolution in vitreous GeSex thin films from secondary ion mass spectrometry measurements;Materials Science and Engineering: B;1992-04

3. Photodissolution profile of silver in amorphous chalcogenide GeSex thin films;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1992-03

4. Photodoping of amorphous chalcogenides by metals;Advances in Physics;1991-10

5. Ag dissolution kinetics in amorphous GeSe5.5 thin films from “In-situ” resistance measurements versus time;Physica Status Solidi (a);1991-02-16

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