Optimization of Amorphous Carbon-Deposited Antireflective Layer for Advanced Lithography-Reference-Cited by-同舟云学术

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Optimization of Amorphous Carbon-Deposited Antireflective Layer for Advanced Lithography

Published:1993-12-30 Issue:Part 1, No. 12B Volume:32 Page:5909-5913
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Tani Yoshiyuki,Mito Hideaki,Okuda Yoshimitsu,Todokoro Yoshihiro,Tatsuta Toshiaki,Sawai Mikio,Tsuji Osamu

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Tunable broadband absorption in continuous and porous textured Si/C bilayers: A comparative study;Optical Materials;2022-11

2. Optical properties of hydrogenated amorphous carbon thin films prepared by dc saddle field plasma-enhanced chemical vapor deposition;Journal of Non-Crystalline Solids;2005-04

3. Novel organic, polymeric materials for electronics applications;MRS Proceedings;2002

4. A novel bottom antireflective coating working for both KrF and ArF excimer laser lithography;Microelectronic Engineering;2000-06

5. Hexamethyldisiloxane film as the bottom antireflective coating layer for ArF excimer laser lithography;Applied Optics;1999-08-01

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