Homogeneity of Residual Layer thickness in UV Nanoimprint Lithography
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Reference9 articles.
1. Nanoimprint lithography
2. Patterning nonflat substrates with a low pressure, room temperature, imprint lithography process
3. Local mass transport and its effect on global pattern replication during hot embossing
4. Front Matter: Volume 6520
5. Fabrication of Capacity-Equalized Mold for Homogenizing Residual Layer Thickness in Imprint Lithography
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