Ni Oxyhydroxide Thin Films Prepared by Reactive Sputtering Using O2+ H2O Mixed Gas-Reference-Cited by-同舟云学术

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Ni Oxyhydroxide Thin Films Prepared by Reactive Sputtering Using O2+ H2O Mixed Gas

Published:2009-01-20 Issue:1 Volume:48 Page:015501
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Ueta Hideaki,Abe Yoshio,Kato Kiyohiko,Kawamura Midori,Sasaki Katsutaka,Itoh Hidenobu

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 27 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Influence of H2 on the properties of NiOxHy thin films deposited by reactive direct current magnetron sputtering for electrochromic devices;Thin Solid Films;2024-08

2. Stable CO₂ reduction under natural air on Ni–Sn hydroxide photocatalyst with dynamic renewable oxygen vacancies;Nanotechnology;2024-05-24

3. Two-color electrochromic devices using a tungsten oxide and nickel oxide double layer;Japanese Journal of Applied Physics;2022-12-15

4. Electrochromic properties of sputter-deposited rhodium oxide thin films of varying thickness;Thin Solid Films;2020-09

5. Electrochromism of nitrogen-doped tungsten oxide thin films;Materials Today: Proceedings;2020

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