Adhesion Control between Resist and Photomask Blank-Reference-Cited by-同舟云学术

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Adhesion Control between Resist and Photomask Blank

Published:2009-06-22 Issue:6 Volume:48 Page:06FG01
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Kurihara Masaaki,Hatakeyama Sho,Yoshida Kouji,Abe Makoto,Totsukawa Daisuke,Morikawa Yasutaka,Mohri Hiroshi,Hoga Morihisa,Hayashi Naoya,Ohtani Hiroyuki,Fujihira Masamichi

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Reference8 articles.

1. Characterization of Surface Energetic Behavior by Atomic Force Microscopy

2. Analysis of Resist Pattern Collapse by Direct Peeling Method with Atomic Force Microscope Tip

3. Methodology of adhesive energy for photomask fabrication using scanning probe microscopy

4. Status and Challenges of Template Fabrication Process for UV Nanoimprint Lithography

5. Analysis of pattern collapse of ArF excimer laser resist by direct peeling method with atomic force microscope tip

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Innovative UV nanoimprint lithography using a condensable alternative chlorofluorocarbon atmosphere;Microelectronic Engineering;2015-02

2. Surface Preparations Impact on 248nm Deep UV Photo Resists Adhesion during a Wet Etch;Solid State Phenomena;2012-12

3. Reactive-monolayer-assisted Thermal Nanoimprint Lithography;Journal of Photopolymer Science and Technology;2012

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