An Efficient Improvement for Barrier Effect of W-filled Contact-Reference-Cited by-同舟云学术

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An Efficient Improvement for Barrier Effect of W-filled Contact

Published:1996-02-28 Issue:Part 1, No. 2B Volume:35 Page:1115-1119
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Yeh Wen-Kuan,Chan Kuang-Yang,Chang Ting-Chang,Tsai Ming-Hsing,Chen Sheng-Hsiung,Chen Mao-Chieh,Lin Mou-Shiung

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Chemical mechanical polishing for selective CVD-W;Materials Chemistry and Physics;1997-10

2. Effect of Thin Tungsten Oxide on Resistance Increase in Annealed Aluminum/Chemical Vapor Deposited Tungsten Interconnects;Journal of The Electrochemical Society;1997-01-01

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