Al-Induced Crystallization of an Amorphous Si Thin Film in a Polycrystalline Al/Native SiO2/Amorphous Si Structure-Reference-Cited by-同舟云学术

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Al-Induced Crystallization of an Amorphous Si Thin Film in a Polycrystalline Al/Native SiO2/Amorphous Si Structure

Published:1996-04-15 Issue:Part 1, No. 4A Volume:35 Page:2052-2056
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Kim Jin Hyeok,Lee Jeong Yong

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 76 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Electric-field-enhanced aluminum-induced crystallization of amorphous silicon thin film using decreasing stepwise current method;Journal of Non-Crystalline Solids;2023-11

2. Influence of current density on constant current electric field enhanced aluminum induced crystallization of amorphous silicon thin films;Thin Solid Films;2023-08

3. Rapid electric field-enhanced crystallization of amorphous silicon thin films with an aluminum layer;Materials Science in Semiconductor Processing;2023-05

4. Low temperature annealing of nanocrystalline Si paste for pn junction formation;Materials Science in Semiconductor Processing;2021-11

5. Crystallization of silicon oxide films using Al as a catalyst;Journal of the Korean Physical Society;2021-08-30

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