Down to0.1 µmPattern Replication in Synchrotron Radiation Lithography
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Published:1996-07-15
Issue:Part 1, No. 7
Volume:35
Page:4133-4137
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ISSN:0021-4922
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Container-title:Japanese Journal of Applied Physics
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language:en
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Short-container-title:Jpn. J. Appl. Phys.
Author:
Morigami Mitsuaki,Yamashita Yoshio,Nishino Junichi,Yamaoka Yoshikazu,Nakao Masao
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering