Mercury-Sensitized Hydrogen Radical Photoetching of Hydrogenated Amorphous Silicon
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Published:1996-12-01
Issue:Part 2, No. 12A
Volume:35
Page:L1547-L1549
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ISSN:0021-4922
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Container-title:Japanese Journal of Applied Physics
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language:
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Short-container-title:Jpn. J. Appl. Phys.
Author:
Hiramatsu Masato,Kawakyu Yoshito
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering