Characterization and Improvement of GaAs Layers Grown on Si Using an Ultrathin a-Si Film as a Buffer Layer

Author:

Hao Maosheng,Shao Chunlin,Soga Tetsuo,Jimbo Takashi,Umeno Masayoshi,Liang Junwu,Zheng Lianxi,Xiao Zhibo,Xiao Jianfei

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Heteroepitaxial Growth of III-V Semiconductors on Silicon;Crystals;2020-12-21

2. Three-step growth of metamorphic GaAs on Si(001) by low-pressure metal organic chemical vapor deposition;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2013-09

3. Interfacial and Electrical Characterization of Atomic-Layer-Deposited HfO[sub 2] Gate Dielectric on High Mobility Epitaxial GaAs/Ge Channel Substrates;Journal of The Electrochemical Society;2010

4. Heteroepitaxial technologies of III–V on Si;Solar Energy Materials and Solar Cells;2001-02

5. Observation of the dielectric local mode related to divacancies in p-silicon;Journal of Experimental and Theoretical Physics;1997-08

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