Removal of Gas Phase Ions by Energy Selection of Secondary Ions
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Link
http://stacks.iop.org/1347-4065/13/i=5/a=917/pdf
Cited by 9 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. F and Cl detection limits in secondary ion mass spectrometry measurements of Si and SiO2 samples;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2010-09
2. Improved secondary ion mass spectroscopy detection limits of hydrogen, carbon, and oxygen in silicon by suppression of residual gas ions using energy and ejection angle filtering;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1997-09
3. Study of the background sources in the trace analysis of carbon using secondary ion mass spectrometry;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1989-07
4. Formation of MO+ions from metal oxides bombarded by 10‐keV Ar+ions;Journal of Applied Physics;1984-01
5. A Modified Semi-Quantitative Method for Dopant in ZnS Thin Film with an Ion Microanalyzer;Japanese Journal of Applied Physics;1980-10
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