(100) Preferred Orientation of Spinel-Type Iron Oxide Films Prepared by Plasma-Enhanced Metalorganic Chemical Vapor Deposition-Reference-Cited by-同舟云学术

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(100) Preferred Orientation of Spinel-Type Iron Oxide Films Prepared by Plasma-Enhanced Metalorganic Chemical Vapor Deposition

Published:1995-04-15 Issue:Part 1, No. 4A Volume:34 Page:1937-1941
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:
Short-container-title:Jpn. J. Appl. Phys.

Author:

Fujii Eiji,Torii Hideo,Tomozawa Atsushi,Takayama Ryoichi,Hirao Takashi

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Low-Pressure Metallorganic Chemical Vapor Deposition of Fe[sub 2]O[sub 3] Thin Films on Si(100) Using n-Butylferrocene and Oxygen;Journal of The Electrochemical Society;2008

2. Iron–iron oxide composite thin films prepared by chemical vapor deposition from iron pentacarbonyl;Thin Solid Films;1998-11

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