Electron Beam Calibration Method for Character Projection Exposure System EX-8D-Reference-Cited by-同舟云学术

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Electron Beam Calibration Method for Character Projection Exposure System EX-8D

Published:1995-12-30 Issue:Part 1, No. 12B Volume:34 Page:6679-6683
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Sunaoshi Hitoshi,Hattori Kiyoshi,Takamatsu Jun,Ando Atsushi,Wada Hirotsugu,Magoshi Shunko,Yamaguchi Toshio,Sato Shinji,Nishimura Shinsuke,Housai Hiroaki,Hashimoto Susumu,Yoshikawa Ryouichi,Takigawa Tadahiro

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. A method for evaluating aberration in the crossover image in mask irradiation optics of electron beam;Review of Scientific Instruments;2002-02

2. Fabrication of Micro-Marks for Electron-Beam Lithography;Japanese Journal of Applied Physics;1997-12-30

3. Evaluation of Shaping Gain Adjustment Accuracy Using Atomic Force Microscope in Variably Shaped Electron-Beam Writing Systems;Japanese Journal of Applied Physics;1997-12-30

4. Fabrication Process of Character Projection Mask for EB Lithography;Japanese Journal of Applied Physics;1996-12-30

5. Recent Progress in Electron-Beam Cell Projection Technology;Japanese Journal of Applied Physics;1996-12-30

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