Ab initio Molecular Orbital Study on Hydrogen Radical Addition Reactions to Graphite Surface and Subsequent Initial Surface Process in Silane Plasma Chemical Vapor Deposition-Reference-Cited by-同舟云学术

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Ab initio Molecular Orbital Study on Hydrogen Radical Addition Reactions to Graphite Surface and Subsequent Initial Surface Process in Silane Plasma Chemical Vapor Deposition

Published:2003-12-10 Issue:Part 1, No. 12 Volume:42 Page:7478-7481
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Sato Kota,Shinagawa Eiji,Nakajima Kenji,Miyazaki Kaori,Koinuma Hideomi

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Link

http://stacks.iop.org/1347-4065/42/i=12R/a=7478/pdf

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Theoretical Study on a Stable Structure and Hydrogen Adsorption of Hexagonal Boron Phosphide based on Density Functional Theory;Japanese Journal of Applied Physics;2013-12-01

2. Quantifying the flux and spatial distribution of atomic hydrogen generated by a thermal source using atomic force microscopy to measure the chemical erosion of highly ordered pyrolytic graphite;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2007-05

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