Effect of Post-treatment on Electrical Properties of Amorphous Hydrogenated Carbon Films Deposited by Gridless Ion Beam Deposition
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Published:2003-01-15
Issue:Part 1, No. 1
Volume:42
Page:259-262
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ISSN:0021-4922
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Container-title:Japanese Journal of Applied Physics
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language:en
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Short-container-title:Jpn. J. Appl. Phys.
Author:
Chen Chia-Fu,Li Yan-Way,Huang Hsiu-Ling
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering