Investigation of Surface Contamination on Silicon Oxide after Hydrofluoric Acid Etching by Noncontact Capacitance Method
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Published:2003-12-10
Issue:Part 1, No. 12
Volume:42
Page:7601-7602
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ISSN:0021-4922
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Container-title:Japanese Journal of Applied Physics
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language:en
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Short-container-title:Jpn. J. Appl. Phys.
Author:
Kohno Motohiro,Kitajima Toshikazu,Hirae Sadao,Yokoyama Shin
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering