Fabrication and Characteristics of Amorphous Carbon Films Grown in Pure Methane Plasma by using Radio Frequency Plasma Enhanced Chemical Vapor Deposition-Reference-Cited by-同舟云学术

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Fabrication and Characteristics of Amorphous Carbon Films Grown in Pure Methane Plasma by using Radio Frequency Plasma Enhanced Chemical Vapor Deposition

Published:2003-04-15 Issue:Part 1, No. 4A Volume:42 Page:1744-1748
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Cho Kyung-Jea,Ryu Jeong-Tak,Baek Yang-Gyu,Ikuno Takashi,Honda Shin-ichi,Katayama Mitsuhiro,Hirao Takashi,Oura Kenjiro

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Link

http://stacks.iop.org/1347-4065/42/i=4R/a=1744/pdf

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Thermodynamic Simulation and Experimental Investigation of Plasma Preparation of Nanosized Carbon Using Propane;Journal of Nanomaterials;2019-04-17

2. Low-temperature fabrication of nanographene on a copper substrate using pentacene;Thin Solid Films;2019-04

3. Guidelines for bottom-up approach of nanocarbon film formation from pentacene using heated tungsten on quartz substrate without metal catalyst;Japanese Journal of Applied Physics;2018-02-16

4. Properties of pentacene-based films prepared using a heated tungsten mesh;Thin Solid Films;2014-11

5. Synthesis of structure controlled carbon nanomaterials by AC arc plasma process;Powder Technology;2014-04

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