A Buried-Collector Layer by Arsenic Diffusion from an Oxidized Arsenic-Implanted Amorphous Silicon
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Published:1990-10-20
Issue:Part 2, No. 10
Volume:29
Page:L1926-L1928
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ISSN:0021-4922
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Container-title:Japanese Journal of Applied Physics
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language:en
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Short-container-title:Jpn. J. Appl. Phys.
Author:
Tsunoda Yoshihiro
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering