Sub-Halfmicron Lithography Using a High-Contrast i-Line CEL
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Published:1990-09-20
Issue:Part 1, No. 9
Volume:29
Page:1860-1861
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ISSN:0021-4922
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Container-title:Japanese Journal of Applied Physics
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language:en
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Short-container-title:Jpn. J. Appl. Phys.
Author:
Tanaka Toshihiko,Uchino Shouichi,Hashimoto Michiaki,Hasegawa Norio,Fukuda Hiroshi,Okazaki Shinji
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering