Low-Temperature Si Surface Cleaning by Hydrogen Beam with Electron-Cyclotron-Resonance Plasma Excitation-Reference-Cited by-同舟云学术

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Low-Temperature Si Surface Cleaning by Hydrogen Beam with Electron-Cyclotron-Resonance Plasma Excitation

Published:1990-07-20 Issue:Part 2, No. 7 Volume:29 Page:L1181-L1184
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Shibata Tomohiro,Nanishi Yasushi,Fujimoto Masatomo

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 32 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Verified modeling of a low pressure hydrogen plasma generated by electron cyclotron resonance;Plasma Sources Science and Technology;2022-10-01

2. Plasma-excited MBE—proposal and achievements through R&D of compound semiconductor materials and devices;Japanese Journal of Applied Physics;2022-01-01

3. Dry Passivation Process for Silicon Heterojunction Solar Cells Using Hydrogen Plasma Treatment Followed by In Situ a-Si:H Deposition;IEEE Journal of Photovoltaics;2018-11

4. Plasma Stripping, Cleaning, and Surface Conditioning;Handbook of Silicon Wafer Cleaning Technology;2018

5. Hybrid axial and radial Si–GaAs heterostructures in nanowires;Nanoscale;2013

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