Amorphous-Silicon Solar Cells Prepared by a Combined Photochemical-Plasma CVD Technique-Reference-Cited by-同舟云学术

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Amorphous-Silicon Solar Cells Prepared by a Combined Photochemical-Plasma CVD Technique

Published:1985-08-20 Issue:Part 1, No. 8 Volume:24 Page:997-1002
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Kenne Jean,Yamada Akira,Konagai Makoto,Takahashi Kiyoshi

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 13 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Effect of chamber pressure on p-type μc-SiC:H thin films prepared by photo-CVD;Thin Solid Films;1997-02

2. Matériaux céramiques déposés en couches minces par plasma CVD;Journal de Physique III;1993-04

3. Amorphous silicon solar cells;Current Topics in Amorphous Materials;1993

4. Simulation of silicon film growth by silane decomposition in a mercury-sensitized photo-CVD process;Korean Journal of Chemical Engineering;1992-01

5. Characterization of hydrogenated amorphous silicon films obtained from rice husk;Solid State Communications;1991-08

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