Author:
Harada Takeshi,Gamo Kenji,Namba Susumu
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Cited by
31 articles.
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1. Angled etching of (001) rutile Nb–TiO2substrate using SF6-based capacitively coupled plasma reactive ion etching;Japanese Journal of Applied Physics;2014-05-19
2. Compound Semiconductor Device Processing;Materials Science and Technology;2013-02-15
3. Precise slit-width control of niobium apertures for superconducting LEDs;Nanotechnology;2010-12-20
4. High etching rates of bulk Nb in Ar/Cl2 microwave discharge;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2009-03
5. Plasma treatment of bulk niobium surface for SRF cavities;Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment;2006-12