Study on Radiation-Induced Reaction in Microscopic Region for Basic Understanding of Electron Beam Patterning in Lithographic Process (I) –Development of Subpicosecond Pulse Radiolysis and Relation between Space Resolution and Radiation-Induced Reactions of Onium Salt

Study on Radiation-Induced Reaction in Microscopic Region for Basic Understanding of Electron Beam Patterning in Lithographic Process (I) –Development of Subpicosecond Pulse Radiolysis and Relation between Space Resolution and Radiation-Induced Reactions of Onium Salt–

Published:2002-06-30 Issue:Part 1, No. 6B Volume:41 Page:4208-4212
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Kozawa Takahiro,Saeki Akinori,Yoshida Yoichi,Tagawa Seiichi

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Link

http://stacks.iop.org/1347-4065/41/i=6S/a=4208/pdf

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