A Metastable Precursor in the Oxidation of Si(111)-(7× 7)-Reference-Cited by-同舟云学术

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A Metastable Precursor in the Oxidation of Si(111)-(7× 7)

Published:2002-12-15 Issue:Part 2, No. 12B Volume:41 Page:L1419-L1421
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:
Short-container-title:Jpn. J. Appl. Phys.

Author:

Okuyama Hiroshi,Miki Takashi,Aruga Tetsuya,Nishijima Mitsuaki

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Link

http://stacks.iop.org/1347-4065/41/i=12B/a=L1419/pdf

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Adsorption and dissociation of oxygen molecules on Si(111)-(7×7) surface;The Journal of Chemical Physics;2013-11-21

2. Initial Products in the Oxidation of Si(111)-7×7 Surface Using O₂ at 300 K and Those Formation Processes Observed by Real-time Synchrotron Radiation X-ray Photoelectron Spectroscopy;Hyomen Kagaku;2012

3. Immediate Product after Exposing Si(111)-7×7 Surface to O2at 300 K;Japanese Journal of Applied Physics;2010-11-22

4. Initial Adsorption Dynamics of O2 on Si(111)-7*7 Surface at Room Temperature;Hyomen Kagaku;2006

5. Imaging and Manipulation of Initial Oxidation Product on Si(111)-(7×7);Japanese Journal of Applied Physics;2005-07-26

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