A Study of Sapphire Etching Characteristics Using BCl3-based Inductively Coupled Plasmas
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Link
http://stacks.iop.org/1347-4065/41/i=10R/a=6206/pdf
Cited by 19 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Sapphire Fabry–Perot Pressure Sensor at High Temperature;IEEE Sensors Journal;2021-01-15
2. Design and Fabrication of Micro-LED Display with Sapphire Micro-Reflector Array;2020 IEEE 33rd International Conference on Micro Electro Mechanical Systems (MEMS);2020-01
3. Fabrication of an AlN ridge structure using inductively coupled Cl2/BCl3 plasma and a TMAH solution;Japanese Journal of Applied Physics;2019-01-25
4. Patterned Sapphire Substrates for III-Nitride Epitaxial Growth;International Journal of Automation Technology;2018-03-01
5. Inductively coupled plasma reactive-ion etching of β-Ga2O3: Comprehensive investigation of plasma chemistry and temperature;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2017-07
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