Electrical Characteristics of the Pt/SrBi2.4Ta2O9/ZrO2/Si Structure for Metal–Ferroelectric-Insulator–Semiconductor Field-Effect-Transistor Application
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Link
http://stacks.iop.org/1347-4065/41/i=9R/a=5645/pdf
Cited by 12 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Low-voltage operation of Si-based ferroelectric field effect transistors using organic ferroelectrics, poly(vinylidene fluoride–trifluoroethylene), as a gate dielectric;Japanese Journal of Applied Physics;2016-03-08
2. Fabrication and Characterization of Metal–Ferroelectric–Insulator–Semiconductor Capacitor Structure with Ferroelectric (Bi,Pr)(Fe,Mn)O3Thin Films;Japanese Journal of Applied Physics;2013-04-01
3. Electrical properties of metal-ferroelectric-insulator-semiconductor structure with Lanthanum Dysprosium Oxide and SrBi2Ta2O9;Journal of the Korean Physical Society;2011-09-15
4. Fabrication and Properties of $\hbox{Pt}/\hbox{Bi}_{3.15}\hbox{Nd}_{0.85} \hbox{Ti}_{3}\hbox{O}_{12}/\break\hbox{HfO}_{2}/\hbox{Si}$ Structure for Ferroelectric DRAM (FEDRAM) FET;IEEE Electron Device Letters;2009-05
5. Effects of Annealing on the Electrical Properties of the BLT/STA/Si Structure for Ferroelectric-Gate Field-Effect Transistors;Journal of the Korean Physical Society;2007-08-14
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