Potential Distribution in the End Region of the GAMMA10 Tandem Mirror Associated with Electron Flow Control-Reference-Cited by-同舟云学术

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Potential Distribution in the End Region of the GAMMA10 Tandem Mirror Associated with Electron Flow Control

Published:1997-11-15 Issue:11 Volume:66 Page:3461-3469
ISSN:0031-9015
Container-title:Journal of the Physical Society of Japan
language:en
Short-container-title:J. Phys. Soc. Jpn.

Author:

Yoshimura Yasuo¹,Saito Teruo¹,Kiwamoto Yasuhito¹,Tatematsu Yoshinori¹,Kajiwara Ken¹,Miyaue Hidetoshi¹,Abe Hiraku¹,Tamano Teruo¹

Affiliation:

1. Plasma Research Center, University of Tsukuba, Ibaraki 305

Publisher

Physical Society of Japan

Subject

General Physics and Astronomy

Link

http://journals.jps.jp/doi/pdf/10.1143/JPSJ.66.3461

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Expansion of Scaling Law of Field-Aligned Potential Difference with Increased Plug ECRH Power in GAMMA 10;Journal of Plasma and Fusion Research;2004

2. Potential Linkage between the Plug Region and an End Plate in GAMMA 10.;Journal of Plasma and Fusion Research;2002

3. Axi-symmetrization of radiation pattern and two wave heating of fundamental ECRH in GAMMA 10;Fusion Engineering and Design;2001-01

4. Measurement and Control of End Loss Electrons from the GAMMA 10 Tandem Mirror;Fusion Technology;1999-01

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