Dependence of Contact Resistance on Substrate Doping and Impact of Mixed Ion Implantation
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Published:1999-10-15
Issue:Part 1, No. 10
Volume:38
Page:5783-5787
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ISSN:0021-4922
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Container-title:Japanese Journal of Applied Physics
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language:en
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Short-container-title:Jpn. J. Appl. Phys.
Author:
Heo Yeon-Cheol,Chung Sang-Tae,Park Chan Kwang,Lee Jeong-Ho,Koh Yo-Hwan,Park Byung Gook,Lee Jong Duk
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering