Effects of Rapid Thermal Annealing on Cobalt Silicided p+poly-Si Gates Fabricated by BF2+Implantation into Bilayered CoSi/a-Si Films
-
Published:1999-07-15
Issue:Part 1, No. 7A
Volume:38
Page:3993-3996
-
ISSN:0021-4922
-
Container-title:Japanese Journal of Applied Physics
-
language:en
-
Short-container-title:Jpn. J. Appl. Phys.
Author:
Lai Wen-Koi,Liu Han-Wen,Juang Miin-Horng,Cheng Huang-Chung
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering