Author:
Nakazawa Keisuke,Onodera Toshio,Sasago Masaru
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Cited by
2 articles.
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1. Evaluation of High-Transmittance Attenuated Phase Shifting Mask for 157 nm Lithography;Japanese Journal of Applied Physics;2002-06-30
2. Evaluation of high transmittance attenuated phase shifting mask for 157 nm lithography;Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.01EX468)