Atomic Force Microscopy Study on the Dissolution Processes of Chemically Amplified Resists for KrF Excimer Laser Lithography
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Published:1999-05-15
Issue:Part 1, No. 5A
Volume:38
Page:2997-3000
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ISSN:0021-4922
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Container-title:Japanese Journal of Applied Physics
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language:en
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Short-container-title:Jpn. J. Appl. Phys.
Author:
Kanzaki Kenichi,Ohfuji Takeshi,Sasago Masaru,Tagawa Seiichi
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering