Effects of Oxygen Gas Addition and Substrate Cooling on Preparation of Amorphous Carbon Nitride Films by Magnetron Sputtering-Reference-Cited by-同舟云学术

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Effects of Oxygen Gas Addition and Substrate Cooling on Preparation of Amorphous Carbon Nitride Films by Magnetron Sputtering

Published:1998-09-15 Issue:Part 1, No. 9A Volume:37 Page:4722-4725
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Yokomichi Haruo,Sakima Hiroyuki,Masuda Atsushi

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Improvement in thermal stability of B–C–N thin films fabricated by magnetron sputtering using graphite and BN co-target;Vacuum;2006-05

2. Microstructural evolution of allylamine polymerized plasma films;Surface and Coatings Technology;2006-05

3. Density functional calculations of dangling bonds for CN and SiN films;Solid State Communications;2005-04

4. Preparation of boron–carbon–nitrogen thin films by magnetron sputtering;Vacuum;2002-08

5. Fabrication of amorphous carbon nitride films by hot-wire chemical vapor deposition;Thin Solid Films;2001-09

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