Synthesis of Silicon-Containing Photoresists for ArF Excimer Laser Lithography-Reference-Cited by-同舟云学术

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Synthesis of Silicon-Containing Photoresists for ArF Excimer Laser Lithography

Published:1998-12-30 Issue:Part 1, No. 12B Volume:37 Page:6869-6872
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Kim Young-Dae,Park Sang-Jin,Lee Haiwon,Kim Eung-Ryul,Choi Sang-Jun,Lee Si-Hyeung

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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2. Post annealing effects on the properties of sputtered nano-crystallite indium tin oxide thin films on flexible polyimide substrate;physica status solidi (c);2008-08

3. SYNTHESIS OF THE TERPOLYMER METHYL METHACRYLATE- STYRENE-BIS(4-METHACRYLOYLMETHYLPHENYL)-SULPHONE;International Journal of Polymeric Materials;2004-05

4. Characteristics of indium tin oxide films deposited by bias magnetron sputtering;Materials Science and Engineering: B;2002-06

5. Preparation and Characterization of Novel Polymers Having Pendant Ketal Moieties for Positive Photoresists;Macromolecular Chemistry and Physics;2001-10-01

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