Kernel Count Reduction in Model Based Optical Proximity Correction Process Models-Reference-Cited by-同舟云学术

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Kernel Count Reduction in Model Based Optical Proximity Correction Process Models

Published:2009-06-22 Issue:6 Volume:48 Page:06FA05
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Li Jianliang,Li Xiaohai,Lugg Robert,Melvin Lawrence S.

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Reference3 articles.

1. Advanced model formulations for optical and process proximity correction

2. Etch modeling in RET synthesis and verification flow

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