Optimization of Deposition Process and Microscopic Characterization of Highly Oriented Aluminum Nitride Thin Films for Bimorph Structures of Piezoelectric Tunable Capacitors-Reference-Cited by-同舟云学术

Optimization of Deposition Process and Microscopic Characterization of Highly Oriented Aluminum Nitride Thin Films for Bimorph Structures of Piezoelectric Tunable Capacitors

Published:2009-02-20 Issue:2 Volume:48 Page:021402
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Nagano Toshihiko,Nishigaki Michihiko,Itaya Kazuhiko,Kawakubo Takashi

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Reference18 articles.

1. Distributed MEMS true-time delay phase shifters and wide-band switches

2. Micromachined low-loss microwave switches

3. Development of micromachined RF switches with piezofilm actuation

4. Piezoelectric actuation of microbridges using AlN

5. RF-MEMS Tunable Capacitor With 3 V Operation Using Folded Beam Piezoelectric Bimorph Actuator

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