Study on Positive–Negative Inversion of Chlorinated Resist Materials
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,General Engineering
Link
http://stacks.iop.org/1882-0786/4/i=7/a=076501/pdf
Reference15 articles.
1. Quantum Wire Fabrication by E-Beam Elithography Using High-Resolution and High-Sensitivity E-Beam Resist ZEP-520
2. Influence of molecular weight of resist polymers on surface roughness and line-edge roughness
3. Study on resist sensitivities for nano-scale imaging using water window X-ray microscopy
4. Ion Beam Irradiation Effects on Resist Materials
5. Radiation effects of ion beams on polymers
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