Hg-Sensitized Photochemical Vapor Deposition Application to Hydrogenated Amorphous Silicon Photoconversion Layer Overlaid on Charge Coupled Device
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Published:1995-05-15
Issue:Part 1, No. 5A
Volume:34
Page:2223-2228
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ISSN:0021-4922
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Container-title:Japanese Journal of Applied Physics
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language:
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Short-container-title:Jpn. J. Appl. Phys.
Author:
Nozaki Hidetoshi,Sakuma Naoshi,Niiyama Takako,Ihara Hisanori,Ishizuka Yoshiki,Ichinose Hideo,Iida Yoshinori,Sasaki Michio,Manabe Sohei
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering