Self-Development Mechanism of Nitrocellulose Resist: Electron Beam Irradiation-Reference-Cited by-同舟云学术

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Self-Development Mechanism of Nitrocellulose Resist: Electron Beam Irradiation

Published:1995-04-15 Issue:Part 1, No. 4A Volume:34 Page:2049-2052
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:
Short-container-title:Jpn. J. Appl. Phys.

Author:

Uchida Takashi,Kaneko Hidehiko,Yasuoka Yoshizumi,Gamo Kenji,SusumuNamba

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Electron beam lithography with feedback using in situ self-developed resist;Nanoscale Research Letters;2014-04-16

2. Stitching error reduction in electron beam lithography with in-situ feedback using self-developing resist;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2013-11

3. Surface treatment of carbon electrodes by electron beam irradiation;Journal of Power Sources;2001-02

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