Mechanism of Reactive Ion Etching Lag for Aluminum Alloy Etching
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Published:1995-04-30
Issue:Part 1, No. 4B
Volume:34
Page:2142-2146
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ISSN:0021-4922
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Container-title:Japanese Journal of Applied Physics
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language:en
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Short-container-title:Jpn. J. Appl. Phys.
Author:
Sato Tetsuo,Fujiwara Nobuo,Yoneda Masahiro
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering