Author:
Wang Qing,Hiroshima Hiroshi,Youn Sung-Won,Suzuki Kenta
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Cited by
3 articles.
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1. Chip-scale pattern modification method for equalizing residual layer thickness in nanoimprint lithography;Japanese Journal of Applied Physics;2018-05-14
2. Real-time full-area monitoring of the filling process in molds for UV nanoimprint lithography using dark field illumination;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2012-11
3. Anisotropic filling phenomenon of cavities in UV nanoimprint lithography;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2011-11