Formation of Palladium Silicide Thin Layers on Si(110) Substrates
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Reference14 articles.
1. Extremely scaled silicon nano-CMOS devices
2. Taking Silicon to the Limit: Challenges and Opportunities
3. Optimized Silicidation Technique for Source and Drain of Fin-Type Field-Effect Transistor
4. Effects of Crystallographic Orientation on Mobility, Surface State Density, and Noise inp-Type Inversion Layers on Oxidized Silicon Surfaces
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