Effect of Discharge Gas Pressure on YBaCuO Epitaxial Film Formation by Reactive RF Magnetron Sputtering-Reference-Cited by-同舟云学术

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Effect of Discharge Gas Pressure on YBaCuO Epitaxial Film Formation by Reactive RF Magnetron Sputtering

Published:1990-04-20 Issue:Part 2, No. 4 Volume:29 Page:L611-L613
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Sakuta Ken,Iyori Masahiro,Katayama Yoshitomo,Kobayashi Takeshi

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 21 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. A comparative study of YBCO thin film growth by inverted cylindrical magnetron sputtering and inverted cylindrical sputtering;Journal of Superconductivity: Incorporating Novel Magnetism;2001

2. Process-kinetics in facing targets sputtering of multi-component oxide thin films;Thin Solid Films;1999-06

3. Dependence of the surface resistance on the microdefects in YBa2Cu3O7−X films;Journal of Crystal Growth;1999-02

4. Study of the processes occurring when sputtering YBa2Cu3O7 − x in pure oxygen;Vacuum;1998-03

5. Influence of working gas pressure on the properties of thin films of high-temperature superconductors obtained by magnetron sputtering;Technical Physics Letters;1998-02

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