Author:
Ishikawa Itsuo,Koike Katsuhiro,Akitsu Tetsuya,Suganomata Shinji,Matsuzawa Hidenori
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Cited by
11 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Negative Ion Plasmas;Encyclopedia of Plasma Technology;2016-12-12
2. Electron Interactions with Cl2, CCl2F2, BCl3, and SF6;Fundamental Electron Interactions with Plasma Processing Gases;2004
3. Electron Interactions With SF6;Journal of Physical and Chemical Reference Data;2000-05
4. Optogalvanic detection of oxygen negative ions in reactive sputtering process;Surface and Coatings Technology;1998-01
5. Capacitive Radio Frequency Discharge Plasma Containing Negative Ions;Journal of the Physical Society of Japan;1997-03-15