Characterization of Indium Tin Oxide and Reactive Ion Etched Indium Tin Oxide Surfaces-Reference-Cited by-同舟云学术

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Characterization of Indium Tin Oxide and Reactive Ion Etched Indium Tin Oxide Surfaces

Published:1990-10-20 Issue:Part 1, No. 10 Volume:29 Page:2243-2246
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Kuo Yue

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 20 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Indium Tin Oxide optical access for magnetic tunnel junctions in hybrid spintronic–photonic circuits;Nanotechnology;2020-07-24

2. Effects of Zr dopant and sintering temperature on electrical properties of In2O3–SrO based ceramics;Ceramics International;2014-09

3. Etching selectivity of indium tin oxide to photoresist in high density chlorine- and ethylene-containing plasmas;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2013-03

4. Current limiting and negative differential resistance in indium oxide based ceramics;Journal of the European Ceramic Society;2010-01

5. Infinitely high etch selectivity during CH4/H2/Ar inductively coupled plasma (ICP) etching of indium tin oxide (ITO) with photoresist mask;Thin Solid Films;2008-04

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