Optical Constants of a-SixC1-x:H Alloy Films Deposited by Tetrode RF Sputtering-Reference-Cited by-同舟云学术

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Optical Constants of a-SixC1-x:H Alloy Films Deposited by Tetrode RF Sputtering

Published:1990-07-20 Issue:Part 2, No. 7 Volume:29 Page:L1049-L1051
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Akimoto Makio,Akaida Yosinori,Gekka Yasuo

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Changes in Optical and Electrical Phenomena Correlated to Structural Configuration in Nanocrystalline Silicon Network;Journal of The Electrochemical Society;2011

2. Optical, electrical and structural properties of SiO : H films prepared from He dilution to the SiH4plasma;Journal of Physics D: Applied Physics;2009-10-14

3. Synthesis of silicon carbide thin films by ion beam sputtering;Thin Solid Films;1998-11

4. Wide optical-gap a-SiO:H films prepared by rf glow discharge;Journal of Non-Crystalline Solids;1997-03

5. Modified magnetic controlled plasma sputtering method;Vacuum;1996-09

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