The Impacts of Back-End High Temperature Thermal Treatments on the Characteristics and Gate Oxide Reliability of Thin Film Transistor in Ultra Large Scale Integrated Circuit Process
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Published:1997-05-15
Issue:Part 1, No. 5A
Volume:36
Page:2628-2632
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ISSN:0021-4922
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Container-title:Japanese Journal of Applied Physics
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language:en
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Short-container-title:Jpn. J. Appl. Phys.
Author:
Lee Kan Yuan,Fang Yean Kuen,Chen Chii Wen,Yaung Dung Niang,Wuu Kuen Hsien,Ho Jyh Jier,Liang Mong Song,Wuu Shou Gwo
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering