Role of Nitrogen Incorporation into Hf-Based High-kGate Dielectrics for Termination of Local Current Leakage Paths-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Role of Nitrogen Incorporation into Hf-Based High-kGate Dielectrics for Termination of Local Current Leakage Paths

Published:2005-10-14 Issue:No. 43 Volume:44 Page:L1333-L1336
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Watanabe Heiji,Kamiyama Satoshi,Umezawa Naoto,Shiraishi Kenji,Yoshida Shiniti,Watanabe Yasumasa,Arikado Tsunetoshi,Chikyow Toyohiro,Yamada Keisaku,Yasutake Kiyoshi

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 17 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Enhanced interfacial reaction of precursor and low temperature substrate in HfO2 atomic layer deposition with highly Ar diluted O2 plasma;Journal of Physics Communications;2020-09-01

2. Normally-off recessed-gate AlGaN/GaN MOS-HFETs with plasma enhanced atomic layer deposited AlO x N y gate insulator;Semiconductor Science and Technology;2019-04-23

3. Improvement on the electrical characteristics of Pd/HfO 2 /6H-SiC MIS capacitors using post deposition annealing and post metallization annealing;Applied Surface Science;2017-08

4. Improved stability of electrical properties of nitrogen-added Al 2 O 3 films grown by PEALD as gate dielectric;Materials Research Bulletin;2016-11

5. Charge-optimized many-body potential for the hafnium/hafnium oxide system;Physical Review B;2010-03-24

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP