Emission Characteristics of Extreme Ultraviolet Radiation from CO2Laser-Produced Xenon Plasma
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Cited by 31 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Vacuum Arc Plasma Heated by Sub-Terahertz Radiation as a Source of Extreme Ultraviolet Light;IEEE Transactions on Plasma Science;2019-01
2. Effect of Nd:YAG Laser Energy on Multilayer Hollow Nanofiber Target's Extreme Ultraviolet Conversion Efficiency;Journal of Macromolecular Science, Part B;2011-06
3. Dynamics of debris from laser-irradiated Sn droplet for EUV lithography light source;SPIE Proceedings;2009-02-12
4. Ablation dynamics of tin micro-droplet irradiated by double pulse laser used for extreme ultraviolet lithography source;Journal of Physics D: Applied Physics;2008-12-03
5. Imaging Diagnostics of Debris from Laser-Produced Tin Plasma with Droplet Target for EUV Light Source;Journal of Laser Micro/Nanoengineering;2008-12
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