Room-Temperature Heteroepitaxial Growth of NiO Thin Films using Pulsed Laser Deposition-Reference-Cited by-同舟云学术

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Room-Temperature Heteroepitaxial Growth of NiO Thin Films using Pulsed Laser Deposition

Published:2000-04-15 Issue:Part 1, No. 4A Volume:39 Page:1817-1820
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Tachiki Minoru,Hosomi Takeshi,Kobayashi Takeshi

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 65 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Room-Temperature Epitaxial Growth of Zn-Doped Iron Oxide Films on c-, a-, and r-Cut Sapphire Substrates;Crystal Growth & Design;2023-11-22

2. A novel NiO-based p-i-n ultraviolet photodiode;Journal of Alloys and Compounds;2023-02

3. Generation of spin-polarized electronic currents using perpendicularly magnetized cobalt ferrite spin-filtering barriers grown on spinel-type-conductive layers;Applied Physics Letters;2023-01-23

4. Annealing-dependent changes in the structural and electrical properties of NiO epitaxial films;Semiconductor Science and Technology;2022-09-19

5. Reactive RF magnetron sputtering epitaxy of NiO thin films on (0001) sapphire and (100) MgO substrates;Japanese Journal of Applied Physics;2022-01-24

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