Influence of RF Power Supply on Electron-Cyclotron-Resonance Plasma with Mirror Confinement for SrTiO3Thin Film Formation
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Cited by 8 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Note: Easy-to-maintain electron cyclotron resonance (ECR) plasma sputtering apparatus featuring hybrid waveguide and coaxial cables for microwave delivery;Review of Scientific Instruments;2016-06
2. Intelligent Materials Synthesis Based on Millimeter-Wave Heating and SPS Methods;Materials Science Forum;2007-03
3. Characteristics of Millimeter-wave Heating and Smart Materials Synthesis;ISIJ International;2007
4. Use of Linear Polymers To Control the Preparation of Luminescent Organic Microcrystals;Langmuir;2005-04-30
5. Low temperature preparation of perovskite oxide films by ECR sputtering assisted with microwave treatment;Surface and Coatings Technology;2003-09
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